Method of chemical-mechanical polishing an electronic component

Details Method of chemical-mechanical polishing an electronic component Method of chemical-mechanical polishing an electronic component

1990-02-23

1992-01-28

Dixon, Jr., William R.

Abrasive tool making process, material, or composition

With inorganic material

Metal or metal oxide

51293, 51307, 51308, C09C 168

Patent

active

050840711

ABSTRACT:
Disclosed is a method of chem-mech polishing an article, preferably an electronic component substrate. The method includes the following steps;

REFERENCES:
patent: 3438811 (1969-04-01), Harriman et al.
patent: 4226623 (1980-10-01), Koshiyama et al.
patent: 4389819 (1983-06-01), Williamson et al.
patent: 4475981 (1984-10-01), Rea
patent: 4529410 (1985-07-01), Khaladji et al.
patent: 4696697 (1987-09-01), Kitano et al.
patent: 4702792 (1987-10-01), Chow et al.
patent: 4769046 (1988-09-01), Senda et al.

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