Method of chemical-mechanical polishing an electronic component

Details Method of chemical-mechanical polishing an electronic component Method of chemical-mechanical polishing an electronic component

1989-03-07

1990-09-04

Lieberman, Paul

Abrasive tool making process, material, or composition

With inorganic material

Metal or metal oxide

51293, 106 3, C09C 168

Patent

active

049541420

ABSTRACT:
Disclosed is a method of chem-mech polishing an electronic component substrate. The method includes the following steps;

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Technical Information, "Chelating Agents in Oxidation-Reduction Reactions", Organic Chemicals Division, W. R. Grace & Co., Lexington, Mass.
Boss et al., U.S. patent application Ser. No. 167,290, filed Mar. 11, 1988.
Beyer et al., U.S. patent application Ser. No. 791,860, filed Oct. 28, 1985.

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