Method of checking design rules for semiconductor integrated cir

Details Method of checking design rules for semiconductor integrated cir Method of checking design rules for semiconductor integrated cir

1996-07-26

1998-01-06

Canney, Vincent P.

Excavating

364488, G06F 1100

Patent

active

057062951

ABSTRACT:
Design rule check errors are outputted to a working file based on data entered from a mask pattern data storage unit and data entered from a design standard file, and a false error is removed from the design rule check errors based on data entered from the mask pattern data storage unit and data entered from the working file, and outputted as a design rule check result. The false error which is removed from the design rule check errors is determined based on whether the design fuel check errors overlap the mask pattern data stored in the mask pattern data storage unit.

REFERENCES:
H. Modarres et al., "A Formal Approach to Design-Rule Checking", IEEE Transactions on Computer-Aided Design, vol. CAD-6, No. 4, Jul. 1987, pp. 561-573.
B.J. Crawford et al., "Computer Verification of Large Scale Integrated Circuit Masks", 1978 IEEE, pp. 132-135.

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