Method of characterizing transparent thin-films using...

Details Method of characterizing transparent thin-films using... Method of characterizing transparent thin-films using...

2007-04-25

2009-06-09

Lee, Hwa S (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S517000

Reexamination Certificate

active

07545510

ABSTRACT:
An imaging, differential optical sectioning interference microscopy (DOSIM) system and method for measuring refractive indices and thicknesses of transparent thin-films. The refractive index and thickness are calculated from two interferometric images of the sample transparent thin-film having a vertical offset that falls within the linear region of an axial response curve of optically sectioning microscopy. Here, the images are formed by a microscope objective in the normal direction, i.e., in the direction perpendicular to the latitudinal surface of the thin-film. As a result, the lateral resolution of the transparent thin-film is estimated based on the Rayleigh criterion, 0.61λ/NA.

REFERENCES:
patent: 5804813 (1998-09-01), Wang et al.
patent: 6370422 (2002-04-01), Richards-Kortum et al.
Wang et al., “Transparent thin-film characterization by using differential optical sectioning interference microscooy”,Applied Optics, vol. 46, No. 30 (2007).
Tsai et al., Deconvolution of local surface response from topography in nanometer profilometry with a dual-scan method,Optics Lettersvol. 24, No. 23 (1999).
Liu et al., Image scanning ellipsometry for measuring nonuniform film thickness profiles,Applied Optics, vol. 33 No. 7 (1994).
Otsuki et al., Two-dimensional thickness measurements based on internal reflection ellipsometry,Applied Opticsvol. 44, No. 8 (2005).
Neil et al., Method of obtaining optical sectioning by using structured light ina conventional microscope,Optics Lettersvol. 22, No. 24 (1997).
Lee et al., Noninterferometric differential confocal microscopy with 2-nm depth resolution,Optics Communications135 (1997) p. 233-237.
Lee et al., Noninterferometric wide-field optical profilometry with nanometer depth resolution,Optics Letter, vol. 27, No. 20 (2002).
Wang et al., Membrane ripples of a living cell measured by non-interferometric widefield optical protilometry,Optics Expressvol. 13, No. 26 (2005).
A. Albersdorfer, G. Elender, G. Mathe, K. R. Neumaier, P. Paduschek, and E. Sackmann, “High resolution imaging microellipsometry of soft surfaces at 3 μm lateral and 5 Å normal resolution,” Appl. Phys. Lett. 72, 2930-2932 (1998).
Q. Zhan and J. R. Leger, “High-resolution imaging ellipsometer,” Appl. Opt. 41, 4443-4450 (2002).
F. Linke and R. Merkel, “Wuantitative ellipsometric microscopy at the silicon-air interface”, Review of Scientific Instruments 76, 063701 (2005).
Chun-Chieh Wang et al., Transparent thin-film characterization by using differential optical sectioning interference microscopy, Abstract (2007).

Affiliated with

Also associated with

Rating

Method of characterizing transparent thin-films using... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of characterizing transparent thin-films using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of characterizing transparent thin-films using... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4125905