Method of calibrating or qualifying a lithographic apparatus...

Details Method of calibrating or qualifying a lithographic apparatus... Method of calibrating or qualifying a lithographic apparatus...

2008-05-20

2008-05-20

Rose, Kiesha (Department: 4176)

Semiconductor device manufacturing: process

With measuring or testing

C438S015000, C438S016000, C438S017000, C438S018000

Reexamination Certificate

active

07374957

ABSTRACT:
A system and method are provided for qualifying or calibrating lithographic apparatus or parts therefor, using a predetermined objective criterion such as Chauvenet's criterion is used to reject measurement points, individually, by field or by substrate.

REFERENCES:
patent: 4439221 (1984-03-01), Smyth et al.
patent: 2005/0006740 (2005-01-01), Letertre et al.
patent: 2005/0009213 (2005-01-01), Wang et al.
patent: 2006/0073686 (2006-04-01), Zach et al.
Ross, Stephen M., Journal of Engineering Technology, Peirce's Criterion for the Elimination of Suspect Experimental Data, Fall 2003, 4 pages.

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