Method of automatically cleaning a vacuum vapor deposition tank

Cleaning and liquid contact with solids – Processes – Combined

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 32, 134 42, B08B 704

Patent

active

054925690

ABSTRACT:
When vapor-depositing a magnetic material 6 onto a base 3 in a vacuum vapor deposition tank 1, to clean the residue of evaporated atoms evaporated from the magnetic material 6 adhering undesirably to members 9, 10 constituting the vacuum vapor deposition tank 1, the members 9, 10 are separated and transported to a cleaning position after the completion of the process of vapor deposition onto the base 3, and the members 9, 10 are cleaned by a cleaning robot 21 arranged to be capable of controlling the cleaning direction, water pressure, and the like at the cleaning position. The members 9, 10 are then allowed to wait at the standby position in preparation for an ensuing vapor deposition process, and cleaning water is accommodated in a tank to ensure reutilization.

REFERENCES:
patent: 3079286 (1963-02-01), Kearney et al.
patent: 3985572 (1976-10-01), Petermann et al.
patent: 4191591 (1980-03-01), Bender et al.
patent: 4595419 (1986-06-01), Patenaude
patent: 4597989 (1986-07-01), Wonsowicz et al.
patent: 4859249 (1989-09-01), Valentini
patent: 5030536 (1991-07-01), Pai et al.
patent: 5109562 (1992-05-01), Albrecht
patent: 5286301 (1994-02-01), Albrecht
patent: 5352298 (1994-10-01), Moulder

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of automatically cleaning a vacuum vapor deposition tank does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of automatically cleaning a vacuum vapor deposition tank, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of automatically cleaning a vacuum vapor deposition tank will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1354002

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.