Method of applying a resist

Details Method of applying a resist Method of applying a resist

1986-06-10

1988-04-19

Bueker, Richard R.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430270, 430311, 430322, 430327, 430935, 427 9, 427240, G03C 500

Patent

active

047389109

ABSTRACT:
A photoresist process which comprises a process for spin-coating a substrate with a resist, a process for transferring a mask pattern onto the coated resist film followed by exposure, and a developing process for forming a pattern on the substrate after the pattern has been exposed. When the developed pattern of the resist pulsates with the increase or decrease of parameters in the process for applying resist, the value of the parameter is set to a value that corresponds to an extreme value of the pulsation.

REFERENCES:
patent: 4500615 (1985-02-01), Iwai

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