Method of applying a layer in accordance with a pattern on a sub

Details Method of applying a layer in accordance with a pattern on a sub Method of applying a layer in accordance with a pattern on a sub

1980-09-02

1982-09-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430167, 430270, 430271, 430296, 430907, 430927, 430966, 430325, 427 431, 260349, G03C 171, B05D 306, G03C 160, G03F 708

Patent

active

043484727

ABSTRACT:
A method of providing a negative electron and/or X-ray resist material on a substrate comprising applying a layer of resist material to the substrate, exposing the layer to a pattern of electrons and/or X-rays and removing the unexposed portions of the layer of resist material in which method the resist material comprises a polyvinylcarbazole compound which (a) contains a polymer and/or a copolymer of the formula ##STR1## in which n exceeds 30 which is halogenated in the nucleus or (b) contains a mixture of the copolymer optionally halogenated in the nucleus with a bisazide of the formula

REFERENCES:
patent: 3284198 (1966-11-01), Grotta et al.
patent: 3421891 (1969-01-01), Inami et al.
patent: 3538125 (1970-11-01), Kornfeld et al.
patent: 3705031 (1972-12-01), Kinjo et al.
Chemical Abstracts, vol. 82, 1975, Ab. #163043y, (Kazuhisa et al.-Japan Kokai 74-106, 585).
Fredericks et al., IBM Technical Disclosure Bulletin, vol. 19, No. 11, 4/77, p. 4193.
Ku et al., "Polymeric Electron Beam Resists," J. Electrochemical Soc., 7/69, pp. 980-985.
Derwent Abstract #20983, 1979, (Jap-Kokai 54-17,015).
CRL Critical Reviews in Solid State Sciences, Feb. 1979, pp. 251-262.
Ordung, P. F. et al., "Electron Resists," Naval Weapons Center, DA 044282, 9/77, p. 9.

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