Method of applying a lacquer film sensitive to ultraviolet and/o

Details Method of applying a lacquer film sensitive to ultraviolet and/o Method of applying a lacquer film sensitive to ultraviolet and/o

1994-07-19

1996-04-09

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427509, 427510, 4272551, 4272556, 427314, C08J 704

Patent

active

055060080

ABSTRACT:
Lacquer films sensitive to ultraviolet (UV) and/or electron beam radiation re applied to substrates as masking layers by a process known as the "spin on process". This invention is a new method of applying a lacquer film sensitive to UV and/or electron beam radiation. A vinyl-containing substance and a linear or cyclic siloxane are vaporized and then deposited onto the substrate to be masked. In the preferred embodiment of the invention, the substances utilized are octamethylcyclotetrasiloxane and trivinylmethylsilane.

REFERENCES:
patent: 4348473 (1982-09-01), Okumura et al.
patent: 4460436 (1984-07-01), Hiraoka
patent: 4517730 (1985-05-01), Meignant
patent: 5231058 (1993-07-01), Maeda et al.

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