Method of and system for opto-electronic inspection of a two-dim

Details Method of and system for opto-electronic inspection of a two-dim Method of and system for opto-electronic inspection of a two-dim

1984-12-27

1987-09-08

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

356237, 358106, 358107, 382 55, G06K 900

Patent

active

046929436

ABSTRACT:
In a method of opto-electronic inspection of a two-dimensional pattern on an object, especially a printed board, a micro-inspection is carried out by subjecting line-by-line scanned picture elements in pixel-by-pixel fashion to a sequence of picture operations for inspection of dimensions and spacings, and the respective result is compared with the corresponding scanned pixel. At the same time a macro-inspection is carried out by combining the scanned pixels to frames and by respective reduction thereof to a single characteristic picture information, whereupon a comparison is again performed, but this time with the corresponding picture information of a reference picture. In this way it is possible to perform a quick and fully automatic real-time inspection of two-dimensional patterns, for instance printed boards, both for minute and hardly visible defects and for macro-defects.

REFERENCES:
patent: 3339179 (1967-08-01), Shelton, Jr. et al.
patent: 4090243 (1978-05-01), Kotera et al.
patent: 4441207 (1984-04-01), Lougheed et al.
patent: 4481664 (1984-11-01), Linger et al.
patent: 4506382 (1985-03-01), Hada et al.
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4556317 (1985-12-01), Sandland et al.

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