Method of and system for determining the aberration of an...

Details Method of and system for determining the aberration of an... Method of and system for determining the aberration of an...

2002-05-03

2008-09-09

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Lamp beam direction or pattern

C356S614000

Reexamination Certificate

active

07423739

ABSTRACT:
For determining aberrations of an optical imaging system (PL), a test object (12,14) comprising at least one delta test feature (10) is imaged either on an aerial scanning detector (110) or in a resist layer (71), which layer is scanned by a scanning device, for example a SEM. A new analytical method is used to retrieve from the data stream generated by the aerial detector or the scanning device different Zernike coefficients (Zn).

REFERENCES:
patent: 5777342 (1998-07-01), Baer
patent: 6570143 (2003-05-01), Neil et al.
patent: 2002/0041377 (2002-04-01), Hagiwara et al.
“Aberration Measurement Method” Research Disclosure, Kenneth Mason Publications, Hampsire, GB, No. 450, Oct. 2001, pp. 1673.
Zach, F et al. “Aberration Analysis Using Reconstructed Aerial Images of Isolated Contacts on Attenduated Psase Shift Masks” Optical Microlithography XIV, Santa Clara, CA, USA Feb. 27-Mar. 2, 2001, vol. 4346, PT. 1-2, pp. 1362-1368.

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