Method of and system for charged particle beam exposure

Details Method of and system for charged particle beam exposure Method of and system for charged particle beam exposure

1996-06-20

1998-02-24

Anderson, Bruce

Radiant energy

With charged particle beam deflection or focussing

With target means

25049222, H01J 37302

Patent

active

057214328

ABSTRACT:
To improve in the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and deflector, a glitch waveform generated during a step change in the output of a D/A converter at the preceding stage of the amplifier, is anticipated and is canceled out with a correction waveform, after the output of the D/A converter has settled, this output is sample held and the step change is interpolated at a smoothing circuit, the deflection area is increased by positioning a electrostatic deflector offset around the optical axis relative to another electrostatic deflector, the response speed of the main deflection is improved by adding auxiliary deflection coils of one or two turn, and the alignment time is reduced by combining the coordinate conversion in the wafer area and in the chip area. In order to correct the astigmatism of the electromagnetic lens, two stages of coils are provided and an electric current corresponding to the quantity of deflection is supplied to the coils.

REFERENCES:
patent: 3914608 (1975-10-01), Malmberg
patent: 4004149 (1977-01-01), Sato et al.
patent: 5134300 (1992-07-01), Kai et al.
patent: 5368613 (1994-11-01), Yasutake et al.
patent: 5399872 (1995-03-01), Yasuda et al.
patent: 5590048 (1996-12-01), Abe et al.

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