Method of and system for charged particle beam exposure

Details Method of and system for charged particle beam exposure Method of and system for charged particle beam exposure

1996-04-04

1998-02-17

Anderson, Bruce

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250396ML, 250398, H01J 3712, H01J 37141

Patent

active

057194025

ABSTRACT:
To improve the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and a deflector. A glitch waveform generated during a step change in the output of a D/A converter at the preceding stage of the amplifier is anticipated and is cancelled out with a correction waveform. After the output of the D/A converter has settled, this output is sample-held and the step change is interpolated with a smoothing circuit. The deflection area is increased by positioning an electrostatic deflector offset around the optical axis relative to another electrostatic deflector, and the response speed of the main deflection is improved by adding auxiliary deflection coils of one or two turns. The alignment time is reduced by combining the coordinate conversion in the wafer area and in the chip area. In order to correct the astigmatism of the electromagnetic lens, two stages of coils are provided and an electric current corresponding to the quantity of deflection is supplied to the coils.

REFERENCES:
patent: 3197635 (1965-07-01), Van Dorsten et al.
patent: 4525629 (1985-06-01), Morita et al.
patent: 4546258 (1985-10-01), Chisholm
patent: 4859856 (1989-08-01), Groves et al.
patent: 5021870 (1991-06-01), Lanio eet al.
patent: 5041731 (1991-08-01), Oae et al.

Affiliated with

Also associated with

Rating

Method of and system for charged particle beam exposure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and system for charged particle beam exposure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and system for charged particle beam exposure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1786076