Method of and photomask for manufacturing optical memory element

Details Method of and photomask for manufacturing optical memory element Method of and photomask for manufacturing optical memory element

1988-12-01

1990-08-07

Ryan, Patrick

Stock material or miscellaneous articles

Circular sheet or circular blank

Recording medium or carrier

428 65, 428913, 3692751, 369284, 369288, 346 76L, 3461351, B32B 302

Patent

active

049467301

ABSTRACT:
A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure, by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion, for forming pits on the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.

REFERENCES:
patent: 4223347 (1980-09-01), Bouwhuis et al.

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