Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer
Patent
1995-04-05
1997-07-15
Font, Frank G.
Optics: measuring and testing
By dispersed light spectroscopy
Utilizing a spectrometer
356346, 356345, G01B 902
Patent
active
056488491
ABSTRACT:
A method for in situ quantification of the morphology and the thickness of a localized area of a surface layer of a thin layer structure entails directing a beam of white light and one or two lazer beams onto a sample enclosed in a vacuum treatment chamber, using a monochromator for a spectral analysis of the white light reflected by the sample and/or differential interferometry with a predetermined wavelength to determine the thickness and the instantaneous rate of variation of the thickness of the surface layer of the sample and to display a monochromatic map of the morphology of the localized area obtained by differential interferometry using a matrix camera. One application is controlling vacuum treatment of thin layer structures, especially semiconductors and integrated circuits, monitoring the morphology, thickness and rate of variation of thickness of the surface layer of the treated sample in situ and in real time.
REFERENCES:
patent: 4984894 (1991-01-01), Kondo
patent: 4988198 (1991-01-01), Kondo
"Fourier-Septrometer for Thickness Measurement", IBM Technical Disclosure Bulletin, vol. 36, No. 12, Dec. 1993, No. 12, Dec. 1993, pp. 49-51.
Kiyoshi et al, "Device for Measuring Film Thickness", Patent Abstracts of Japan, vol. 6, No. 125 (P-127), Jul. 1982 & JP-A-47 052 807.
Canteloup Jean
Mathias Jacky
Font Frank G.
Kim Robert
Sofie
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