Method of and auxiliary cleaner for use in cleaning a...

Details Method of and auxiliary cleaner for use in cleaning a... Method of and auxiliary cleaner for use in cleaning a...

2006-06-13

2006-06-13

Wilson, Gregory (Department: 3749)

Heating

Work chamber having heating means

Work chamber having gaseous material supply or removal...

C432S002000, C015S304000, C015S406000

Reexamination Certificate

active

07059848

ABSTRACT:
A diffusion furnace of semiconductor manufacturing equipment is cleaned efficiently with a cleaning gas (ClF3) by using an auxiliary cleaner. The auxiliary cleaner is inserted into an inner tube of the wafer diffusion furnace. The auxiliary cleaner has a cylindrical body that occupies a central region of the interior of the furnace but is spaced apart from an inner wall surface of the inner tube. Accordingly, the gas is confined to a peripheral region adjacent the inner wall surface. As a result, a relatively small amount of the cleaning gas is comsumed during the cleaning process.

REFERENCES:
patent: 5851307 (1998-12-01), Gilmer et al.
patent: 6248177 (2001-06-01), Halbmaier
patent: 6461442 (2002-10-01), Bush et al.
patent: 06-129214 (1993-05-01), None
patent: 1997-0063635 (1997-09-01), None

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