Heating – Work chamber having heating means – Work chamber having gaseous material supply or removal...
Reexamination Certificate
2006-06-13
2006-06-13
Wilson, Gregory (Department: 3749)
Heating
Work chamber having heating means
Work chamber having gaseous material supply or removal...
C432S002000, C015S304000, C015S406000
Reexamination Certificate
active
07059848
ABSTRACT:
A diffusion furnace of semiconductor manufacturing equipment is cleaned efficiently with a cleaning gas (ClF3) by using an auxiliary cleaner. The auxiliary cleaner is inserted into an inner tube of the wafer diffusion furnace. The auxiliary cleaner has a cylindrical body that occupies a central region of the interior of the furnace but is spaced apart from an inner wall surface of the inner tube. Accordingly, the gas is confined to a peripheral region adjacent the inner wall surface. As a result, a relatively small amount of the cleaning gas is comsumed during the cleaning process.
REFERENCES:
patent: 5851307 (1998-12-01), Gilmer et al.
patent: 6248177 (2001-06-01), Halbmaier
patent: 6461442 (2002-10-01), Bush et al.
patent: 06-129214 (1993-05-01), None
patent: 1997-0063635 (1997-09-01), None
Volentine Francos & Whitt PLLC
Wilson Gregory
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