Method of and apparatus for washing a substrate

Details Method of and apparatus for washing a substrate Method of and apparatus for washing a substrate

1996-12-12

1999-01-12

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134105, 134153, 134902, B08B 310

Patent

active

058574743

ABSTRACT:
A substrate washing apparatus includes a cooling system for cooling a substrate to below zero, a wet gas supplying system for supplying a gas containing atomized water to the surface of the substrate cooled by the cooling means to form ice on the surface of said substrate, and an ice removing unit for removing the ice formed on the surface of the substrate. This apparatus removes not only relatively large particles but also fine particles from the substrate.

REFERENCES:
patent: 4491484 (1985-01-01), Williams
patent: 4883775 (1989-11-01), Kobayashi
European Patent Office (EPO) 428,983, May 1991.
W.T. McDermott, et al., "Removing Submicron Surface Particles Using a Cryogenic Argon-Aerosol Technique", Microcontamination, Oct. 1991, pp. 33-36, 94 and 95.
Catalog of "Eco-Snow" of Hughes Aircraft Company, 1994.

Affiliated with

Also associated with

Rating

Method of and apparatus for washing a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and apparatus for washing a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for washing a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1506018