Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-03-29
2005-03-29
Zervigon, Rudy (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S7230IR, C118S7230ER, C156S345330, C156S345340, C156S345430, C156S345440, C156S345480
Reexamination Certificate
active
06872259
ABSTRACT:
A method of and apparatus for providing tunable gas injection in a plasma processing system (10, 10′). The apparatus includes a gas injection manifold (50) having a pressurizable plenum (150) and an array of adjustable nozzle units (250), or an array of non-adjustable nozzles (502, 602), through which gas from the plenum can flow into the interior region (40) of a plasma reactor chamber (14) capable of containing a plasma (41). The adjustable nozzle units include a nozzle plug (160) arranged within a nozzle bore (166). A variety of different nozzle units are disclosed. The nozzle plugs are axially translatable to adjust the flow of gas therethrough. In one embodiment, the nozzle plugs are attached to a plug plate (154), which is displacable relative to an injection plate (124) via displacement actuators (170) connecting the two plates. The displacement actuators are controlled by a displacement actuator control unit (180), which is in electronic communication with a plasma processing system control unit (80). The gas flow into the chamber interior region is preferably controlled by monitoring the pressure in the plenum and in the chamber and adjusting the nozzle units accordingly. Where the nozzle units are not adjustable, a portion of the nozzles are sized to a first flow condition, and another portion of the nozzles are sized to a second flow condition.
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Pillsbury & Winthrop LLP
Tokyo Electron Limited
Zervigon Rudy
LandOfFree
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