Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
Patent
1996-04-10
1998-10-06
Derrington, James
Etching a substrate: processes
Nongaseous phase etching of substrate
Using film of etchant between a stationary surface and a...
216 89, 216 90, 216 99, 264138, 264162, 264340, 264341, 264678, 451 41, 451 53, B24B 100, B24D 500
Patent
active
058172459
ABSTRACT:
An abrasive wheel made of an abrasive which is chemically reactive with a ceramic workpiece and a binder mixed with the abrasive is held against the ceramic workpiece at a temperature ranging from 40.degree. C. to 300.degree. C. preferably 100.degree. C. to 180.degree. C., under at least an atmospheric pressure in a moistening atmosphere within a pressure vessel. The abrasive wheel is rotated in abrading contact with the ceramic workpiece. A surface layer of the ceramic workpiece which is held against the abrasive wheel is mechanically abraded and also subjected to a tribochemical reaction with the abrasive wheel, so that the surface layer of the ceramic workpiece can smoothly and neatly be removed from the ceramic workpiece. The ceramic workpiece thus ground is finished highly accurately and efficiently.
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Iwamoto Jun
Jinbu Yasuhiko
Derrington James
Honda Giken Kogyo Kabushiki Kaisha
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