Method of and apparatus for the removal of gaseous contaminants

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Sulfur or sulfur containing component

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4232405, B01D 5334, C01B 1760

Patent

active

051125889

ABSTRACT:
Gaseous contaminants, especially sulfur dioxide, sulfur trioxide, hydrogen chloride or hydrogen fluoride are removed from flue gases by chemisorption. A solid finely divided sorbent, before being brought into contact with the flue gas, is treated in a reactor with dry steam. The sorbent before introduction into the reactor is brought to a temperature of 10.degree. to 50.degree. C. below the dewpoint temperature of the steam in the reactor and the steam injected into the reactor is introduced at a temperature not more than 60.degree. C. above the dewpoint temperature, preferably 10.degree. to 40.degree. C. above the dewpoint temperature.

REFERENCES:
patent: 3862295 (1975-01-01), Tolles
patent: 4477426 (1984-10-01), Raskin
patent: 4604269 (1986-08-01), Yoon
patent: 4782772 (1988-11-01), Chughtai et al.
patent: 4795619 (1989-11-01), Lerner

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of and apparatus for the removal of gaseous contaminants does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and apparatus for the removal of gaseous contaminants , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for the removal of gaseous contaminants will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2425652

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.