Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1990-07-26
1993-04-20
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118723, 427533, 427534, 427569, C23C 1600
Patent
active
052039242
ABSTRACT:
A method of and an apparatus for synthesizing a diamondlike thin film on a substrate, the method comprising the steps of: generating plasma of gas containing hydrocarbon gas, in a first vacuum vessel having an inflow portion and an outflow portion for the gas such that the substrate is provided in a second vacuum vessel maintained at a pressure lower, by one figure or more, than that of the first vacuum vessel due to flow resistance of the gas between the outflow portion and the substrate; and irradiating the plasma onto the substrate by pressure difference between the first vacuum vessel and the second vacuum vessel while an AC power is being applied to at least one of the substrate and an internal electrode provided in the first vacuum vessel.
REFERENCES:
patent: 4645977 (1987-02-01), Kurokawa et al.
Bulletin of Lectures of the 33rd Conference of the Japan Society of Applied Physics, 3p-ZD-14, 1986.
Whitmell et al., "Thin Solid Films", vol. 35, pp. 255-261, (1986).
Yamamoto et al., "Bulletin of the Japan Society of Precision Engineering", vol. 55, No. 12, pp. 2222-2227, (1989).
Kurokawa Hideo
Mitani Tsutomu
Nakaue Hirokazu
Bueker Richard
Matsushita Electric - Industrial Co., Ltd.
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