Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1980-07-03
1982-01-05
Gantz, Delbert E.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192C, 204192P, 204298, C23C 1500
Patent
active
043092616
ABSTRACT:
A graded surface coating is reactively sputtered onto a tubular substrate by advancing the substrate in an axial direction through a cylindrical sputtering chamber in the presence of a sputter supporting gas. The sputtering chamber includes a cathode liner from which metal is sputtered onto the substrate. A reactive gas is directed into the sputtering chamber from a feed point outside of the chamber, whereby reactive sputtering occurs within the chamber. The reactive gas is induced to flow into the chamber in a direction counter to the direction of advancement of the substrate whereby, as the substrate is progressively advanced through the chamber and the applied coating gradually increases in thickness, the proportion of the reactive gas constituent in the coating increases relative to the metal constituent proportion with increasing thickness of the coating.
REFERENCES:
patent: 3945903 (1976-03-01), Svendor et al.
patent: 3976555 (1976-08-01), Von Hartel
patent: 4128466 (1978-12-01), Harding et al.
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4194962 (1980-03-01), Chambers et al.
G. L. Harding et al., "Graded Metal Carbide Solar Selective Surfaces . . . ", J. Vac. Sci. Technol., 16(6), Nov./Dec. 1979, pp. 2101-2103.
G. L. Harding, "Alternative Grading Profile for Sputtered Selective Surfaces", J. Vac. Sci. Technol, 16(6), Nov./Dec. 1979, pp. 2111-2113.
John A. Thornton et al., "Tubular Hollow Cathode Sputtering . . . ", J. Vac. Sci. Technol., vol. 12, No. 1, Jan./Feb. 1975, pp. 93-97.
Collins Anthony R.
Harding Geoffrey L.
McKenzie David R.
Window Brian
Gantz Delbert E.
Leader William
University of Sydney
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