Method of and apparatus for purifying reduced pressure process c

Details Method of and apparatus for purifying reduced pressure process c Method of and apparatus for purifying reduced pressure process c

1998-07-29

2000-10-24

Knight, Anthony

Seal for a joint or juncture

Seal between fixed parts or static contact against...

Contact seal for other than internal combustion engine, or...

277913, 277918, 277180, 210263, 220304, B01D 5304

Patent

active

061354600

ABSTRACT:
Gas purification resins are encapsulated in deformable, permeable polymer sheaths to form purification rings, gaskets or seals. A primary source of contaminants in advanced vacuum processors equipped with vacuum load-lock systems and process gas purifiers is from the leakage of outside ambient contaminants around O-ring seals. Using gas purification rings, gaskets or seals properly placed inside or outside of the outer O-ring seal, the level of contaminants (particularly hydrocarbons, oxygen and moisture) may be significantly reduced or eliminated. The gas purification ring is preferably a hydrocarbon and/or oxygen and/or moisture absorbing and/or adsorbing material encased within a contaminant permeable casing. The gas purification ring can be round or flattened and is preferably more resilient than the O-rings adjacent thereto which form the seal. An adhesive can be placed around the casing holding the purification resin to prevent movement from its purifying location.

REFERENCES:
patent: 4109922 (1978-08-01), Martin
patent: 4299921 (1981-11-01), Youssef
patent: 5360461 (1994-11-01), Meinzer
patent: 5538545 (1996-07-01), Dauber et al.
patent: 5722668 (1998-03-01), Rice et al.
patent: 5765838 (1998-06-01), Ueda et al.
patent: 5932372 (1999-08-01), Rendina
patent: 5997618 (1999-12-01), Schneider et al.
Article from Microcontamination, Aug. 1993, "Point-of-Use Purfiers Improve Quality of CVD-Grown Films" (published by Millipore).

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