Method of and apparatus for producing cutout mask data

Image analysis – Histogram processing – For setting a threshold

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

382 22, 382 33, 382 56, 358452, G06K 946

Patent

active

050383833

ABSTRACT:
Cutout mask data is easily obtained while setting small unit areas in an original image and displaying them in order on a display unit. Unit areas including vertexes of an outline of a cutout mask are first designated. Unit area images within the unit areas are simultaneously displayed on a display unit. An operator sequentially designates positions of the vertexes while watching the unit area images arrayed in order of the designation. Cutout mask data are formed on the basis of the positions of the vertexes.

REFERENCES:
patent: 4021778 (1977-05-01), Ueda et al.
patent: 4538183 (1985-08-01), Kanno et al.
patent: 4672459 (1987-06-01), Kudo
patent: 4733304 (1988-03-01), Homma et al.
patent: 4868884 (1989-09-01), Miyazaki et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of and apparatus for producing cutout mask data does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and apparatus for producing cutout mask data, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for producing cutout mask data will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1993142

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.