Method of and apparatus for processing photoresist, method of ev

Details Method of and apparatus for processing photoresist, method of ev Method of and apparatus for processing photoresist, method of ev

1998-03-04

1999-12-21

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396611, 118 52, G03D 500

Patent

active

060040475

ABSTRACT:
A resist processing method includes setting a substrate at a specific temperature, forming a resist film on the substrate by applying a resist solution onto the substrate while turning the substrate set at the specific temperature, heating the substrate on which the resist film has been formed, cooling the substrate a specific temperature after the heating process, wherein the thickness of the resist film on the substrate is measured between the heating process and the cooling process.

REFERENCES:
patent: 5143552 (1992-09-01), Moriyama
patent: 5633040 (1997-05-01), Toshima et al.
patent: 5939130 (1999-08-01), Shiraishi et al.
Patent Abstract of Japan, vol. 13, No. 496 (E-843), Nov. 9, 1989, JP-A-1-200623, Aug. 11, 1989.
Patent Abstract of Japan, vol. 13, No. 507 (E-845), Nov. 14, 1989, JP-A-1-204420, Aug. 17, 1989.

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