Method of and apparatus for non-contact temperature measurement

Details Method of and apparatus for non-contact temperature measurement Method of and apparatus for non-contact temperature measurement

1990-10-05

1993-05-04

McGraw, Vincent P.

Optics: measuring and testing

Optical pyrometers

356445, 356446, 374161, 2503381, 118666, G01J 548

Patent

active

052086437

ABSTRACT:
The temperature and radiant energy emissivity of a semiconductor substrate or wafer undergoing processing are monitored by combining indications derived from an interferometer and the intensity of radiant energy emitted from the substrate. The radiant energy intensity is detected at adjacent maxima or minima in the intensity of the interference pattern.

REFERENCES:
patent: 4522510 (1985-06-01), Rosencwaig et al.
patent: 4711790 (1987-12-01), Morishige
patent: 4823291 (1989-04-01), Berman
Donnelly et al., Journal of Vacuum Science Technology, Jan.-Feb. 1990, pp. 84-92.
Hacman, Optik, vol. 28, p. 115, 1968.
Bond et al., Journal of Vacuum Science Technology, Mar. 1981, pp. 335-338.
Saenger, Journal of Applied Physics, Apr. 15, 1988, pp. 2522-2525.

Affiliated with

Also associated with

Rating

Method of and apparatus for non-contact temperature measurement does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and apparatus for non-contact temperature measurement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for non-contact temperature measurement will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1978434