Method of and apparatus for monitoring etching by-products

Fishing – trapping – and vermin destroying

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1566431, G01R 3126, H01L 2166, B44C 122, C03C 1500

Patent

active

057260672

ABSTRACT:
A method of and an apparatus for monitoring etching by-products, capable of detecting and analyzing laser induced fluorescent light generated upon irradiating laser beams onto a by-product formed in the etching process. The method includes the steps of: selecting an excited electron level capable of being borne by molecules or radicals of the by-product; irradiating onto the by-product a laser beam with energy of a wavelength corresponding to the selected excited electron level; optionally exciting the molecules or radicals of the by-product by the irradiated laser beam, thereby forming a primary excited state of the by-product; detecting a laser induced fluorescent light emitted from the by-product during the transition of the by-product from the primary excited state to a secondary excited state which exhibits an energy level lower than the primary excited state; and analyzing the detected laser induced fluorescent light. The apparatus includes an etching chamber for etching a wafer therein, a laser source for irradiating a laser beam onto the wafer in the etching chamber, a plurality of reflecting mirrors for reflecting the irradiated laser beam along at least two parallel paths, and a light detector arranged outwardly of the etching chamber and adapted to detect laser induced fluorescent light generated upon irradiating the laser beam in the etching chamber.

REFERENCES:
patent: 4479848 (1984-10-01), Otsubo et al.
patent: 4675072 (1987-06-01), Bennett et al.
patent: 5002631 (1991-03-01), Giapis et al.

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