Method of and apparatus for inspecting reticle for defects

Optics: measuring and testing – Inspection of flaws or impurities – Having predetermined light transmission regions

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356239, G01N 2188

Patent

active

06064477&

ABSTRACT:
A reticle inspecting apparatus for inspecting a reticle for defects has a transparent of translucent substrate, a circuit pattern formed on the front surface of the substrate, and a phase shifter formed of a light-transmissive film on the front surface of the substrate. In the apparatus, a detection optical system is disposed so as not to gather directly reflected light and directly transmitted light and so as to gather scattered light and diffracted light which has been scattered and diffracted, respectively, by the reticle. This detection optical system enables separation of the gathered light by direction of illumination using detectors and spatial filters disposed respectively on Fourier transform planes to intercept light diffracted by straight edges of the circuit pattern, so as to form images of gathered light on the detectors. A signal processing system having a signal processing unit calculates defects on the basis of the output signals of the detectors and displays the calculated data on a display.

REFERENCES:
patent: 4816686 (1989-03-01), Hara et al.
patent: 4952058 (1990-08-01), Noguchi et al.
patent: 5046847 (1991-09-01), Nakata et al.
patent: 5098191 (1992-03-01), Noguchi et al.
patent: 5225886 (1993-07-01), Koizumi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of and apparatus for inspecting reticle for defects does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and apparatus for inspecting reticle for defects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for inspecting reticle for defects will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-263502

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.