Method of and apparatus for geometric pattern inspection employi

Image analysis – Histogram processing – For setting a threshold

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382 55, 358106, 356237, G06K 952

Patent

active

051194341

ABSTRACT:
A pattern inspection technique and apparatus, suitable for wafer and printed circuit board and related applications, employing novel intelligent imaged-pattern shrinking and expanding architecture to identify permissible line widths, spacing and in surrounding material context, and to identify defects or errors.

REFERENCES:
patent: 4443855 (1984-04-01), Bishop et al.
patent: 4500202 (1985-02-01), Smyth
patent: 4589140 (1986-05-01), Bishop et al.
patent: 4692943 (1987-09-01), Pietzsch et al.
patent: 4776022 (1988-10-01), Fox et al.
patent: 4794647 (1988-12-01), Forgues et al.
patent: 4893346 (1990-01-01), Bishop

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