Method of and apparatus for generating mask layouts

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364490, G06F 1750

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active

054935091

ABSTRACT:
In graphic data representing a symbolic layout for a semiconductor integrated circuit, a plurality of first cutting lines and a plurality of second cutting lines crossing the first cutting lines at right angles are set. First, the graphic data is cut along said first cutting lines to produce a plurality of first segment data items. These first segment data items are each compacted in the direction of the second cutting line. These compacted first segment data items are connected according to the first cutting lines. This connected first segment data is cut along the second cutting lines to produce a plurality of second segment data items. These second segment data items are each compacted in the direction of the first cutting line. These compacted second segment data items are connected to one another to produce a compacted mask layout.

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