Method of and apparatus for forming film with rotary electrode

Details Method of and apparatus for forming film with rotary electrode Method of and apparatus for forming film with rotary electrode

1996-08-07

1998-01-27

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118728, 427573, 427569, C23C 1600

Patent

active

057118140

ABSTRACT:
In a method of and an apparatus for forming a thin film on a substrate, a rotary electrode is provided and rotated so that an electrode surface of the electrode moves and passes by a substrate surface due to the rotation of the electrode. Thereby a reaction gas is supplied into a gap between the substrate surface and the electrode surface. A high-frequency power is applied or dc power to the rotary electrode thereby generating a plasma between the substrate surface and the electrode surface, for forming the thin film by chemical reaction of the reaction gas supplied into the plasma.

REFERENCES:
patent: 4460673 (1984-07-01), Sukigara et al.
patent: 4958591 (1990-09-01), Yamazaki
patent: 5031571 (1991-07-01), Igarashi et al.
patent: 5074456 (1991-12-01), Degner et al.
patent: 5339039 (1994-08-01), Carlile et al.
patent: 5344792 (1994-09-01), Sandhu et al.
patent: 5433813 (1995-07-01), Kuwabara
patent: 5456757 (1995-10-01), Aruga et al.

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