Method of and apparatus for forming a thin film

Details Method of and apparatus for forming a thin film Method of and apparatus for forming a thin film

1987-12-14

1990-01-09

Silverman, Stanley

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 427 42, 427 531, 427541, B05D 108

Patent

active

048927511

ABSTRACT:
A method of forming a thin film wherein a gas which contains an element used to constitute a desired thin film as at least a part of its constituent elements or a condensed solid layer of this gas is irradiated with a high output power laser beam to dissociate the gas or the solid layer of the gas and thereby locally produce a plasma, and a substrate is irradiated with reactive particles produced in the plasma, thereby obtaining a highly-pure high-quality thin film. Also disclosed is an apparatus for realizing this method.

REFERENCES:
patent: 4579750 (1986-04-01), Bowen et al.
patent: 4629859 (1986-12-01), Reddy
patent: 4670064 (1987-06-01), Schachameyer et al.
patent: 4685976 (1987-08-01), Schachameyer et al.

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