Method of and apparatus for detecting defect on photomask

Details Method of and apparatus for detecting defect on photomask Method of and apparatus for detecting defect on photomask

1989-10-10

1993-08-10

Rosenberger, Richard A.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356394, 356239, 356353, 250572, G01N 2100, G01N 2188

Patent

active

052354008

ABSTRACT:
A method of and an apparatus for detecting a defect on a phase-shifting mask for use in a projection aligner in which either or both of respective intensities of transmitted and reflected light beams from the mask illuminated with light are used for detecting a defect on the mask.

REFERENCES:
patent: 3972616 (1976-08-01), Minami et al.
patent: 4559603 (1985-12-01), Yoshikawa
patent: 4623256 (1986-11-01), Ikenaga et al.
patent: 4679938 (1987-07-01), Flamholz
patent: 4681442 (1987-07-01), Wagner
patent: 4952058 (1990-08-01), Noguchi et al.
SPIE, vol. 633 Optical Microlithography V(1986), pp. 138-144, Yabumoto et al.

Affiliated with

Also associated with

Rating

Method of and apparatus for detecting defect on photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and apparatus for detecting defect on photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for detecting defect on photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1729435