Coating apparatus – Gas or vapor deposition – With treating means
Patent
1998-04-15
2000-10-03
Tudor, Harold J.
Coating apparatus
Gas or vapor deposition
With treating means
C23C 1600
Patent
active
H00018686
ABSTRACT:
A method of and apparatus for controlling the potential of a plasma including a metal-walled chamber and a conductive coil which carries a radio-frequency current and is wrapped around the metal-walled chamber to produce a plasma within the chamber. A filament made of refractory metal has two ends, and a central portion formed in the shape of a probe. The central portion of the filament extends into the interior of the chamber and the two ends of the filament pass through a wall of the chamber to the exterior of the chamber. A heating power supply is connected to the two ends to the filament and to the chamber wall for heating the filament to a predetermined temperature above that of the plasma. The heated filament produces thermionic emissions from the filament to the plasma in order to control the plasma potential and eliminate unipolar arcing at the chamber wall.
Jordan Chester L.
McDonnell Thomas E.
Tudor Harold J.
United States of America
LandOfFree
Method of and apparatus for controlling plasma potential and eli does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of and apparatus for controlling plasma potential and eli, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for controlling plasma potential and eli will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-182921