Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized
Patent
1995-12-18
1999-01-26
Padgett, Marianne
Coating processes
Direct application of electrical, magnetic, wave, or...
Electrostatic charge, field, or force utilized
427485, 427562, B05D 5025, B05D 724
Patent
active
058636196
ABSTRACT:
A method of and an apparatus for coating a photoresist film over a wafer, capable of eliminating local non-uniformity of the photoresist film and uniformly controlling the thickness of the photoresist film. The method includes the steps of vaporizing and injecting a liquid photoresist material to form photoresist particles, electrically charging photoresist particles, establishing an electric field in an area where the photoresist particles flow, thereby deflecting the photoresist particles, and selectively taking the photoresist particles passing through a desired zone, and depositing the selected photoresist particles over the wafer. The apparatus includes a Venturi tube for pumping up a liquid photoresist material and injecting the pumped photoresist material in a vapor phase, a first insulating tube adapted to disperse the photoresist particles formed upon injecting the liquid photoresist material, electrodes coupled to a voltage source and adapted to deflect the flow direction of the photoresist particles, a second insulating tube adapted to pass the photoresist particles deflected by the electrode therethrough, and a third insulating tube adapted to take only a portion of the photoresist particles emerging from the second insulating tube.
REFERENCES:
patent: 2967331 (1961-01-01), Kaspar
patent: 4114564 (1978-09-01), Probst
patent: 4170074 (1979-10-01), Hickman et al.
patent: 4433003 (1984-02-01), Gourdine
patent: 5229171 (1993-07-01), Donovan et al.
patent: 5340604 (1994-08-01), Atsushi
patent: 5399388 (1995-03-01), Aklufi
patent: 5520715 (1996-05-01), Oeftering
patent: 5560962 (1996-10-01), Brunger et al.
Dictionary excerpts. (1) Webster's 9th New ColligiateDic.; Merrian-Webster Inc., Springfield, Mass.; 1990 (no month) p. 1309.
(2) Hackh's Chemical Dic.3rd ed; Grant, ed. , McGraw-Hill Book Co., 1944 (no month). p. 893.
Hyundai Electronics Industries Co,. Ltd.
Padgett Marianne
LandOfFree
Method of and apparatus for coating photoresist film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of and apparatus for coating photoresist film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for coating photoresist film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1448554