Method of and apparatus for cleaning workpiece

Details Method of and apparatus for cleaning workpiece Method of and apparatus for cleaning workpiece

1996-03-01

1999-02-09

Warden, Jill

Cleaning and liquid contact with solids

Processes

With treating fluid motion

134 1, 134 6, 134 26, 134 32, 134 36, 134 953, 134153, 1341001, 134902, 15 77, 15 882, 15 883, 15 971, 15102, B08B 302

Patent

active

058688668

ABSTRACT:
A method of and an apparatus for cleaning a thin disk-shaped workpiece that is required to have a high degree of cleanliness, e.g., a semiconductor wafer, a glass substrate, a liquid crystal display, or the like. The method of cleaning the workpiece includes a plurality of cleaning steps, and comprises the steps of holding a workpiece, and performing a liquid jet cleaning of a surface of the workpiece in a first portion of plural cleaning steps. The method further comprises the step of performing a liquid jet cleaning of the surface of the workpiece in a latter portion of the plural cleaning steps.

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