Brushing – scrubbing – and general cleaning – Machines – Wiping
Patent
1996-09-20
1999-01-19
Chin, Randall E.
Brushing, scrubbing, and general cleaning
Machines
Wiping
15 211, 15 77, 15 882, 15 883, 1525651, A46B 1302, A47L 2500
Patent
active
058601813
ABSTRACT:
A method of and an apparatus for cleaning workpiece is suitable for cleaning a substrate such as a semiconductor substrate, a glass substrate, or a liquid crystal panel to a high level of cleanliness. The method of cleaning a workpiece comprises the steps of holding a workpiece, scrubbing the workpiece with a cleaning member, and rubbing the cleaning member against a member having a rough surface to carry out a self-cleaning of the cleaning member. The cleaning member which is contaminated by having scrubbed the workpiece is rubbed against the rough surface, and the rough surface scrapes the contaminant off the cleaning member. Therefore, the contaminant can effectively be removed from the cleaning member, and hence the cleaning member has a high self-cleaning effect.
REFERENCES:
patent: 4476601 (1984-10-01), Oka
patent: 5311634 (1994-05-01), Andros
patent: 5375291 (1994-12-01), Tateyama et al.
patent: 5636401 (1997-06-01), Yonemizu et al.
JP-A-60 240129 (Fujitsu K.K.), 29 Nov. 1985 * abstract *.
IBM Technical Disclosure Bulletin, vol. 38, No. 6, Jun. 1995, New York, US, pp. 527-528, XP000520759 "CMP Pad Conditioner for Nonplanar Polishing Pads" * the whole document *.
Hamada Satomi
Kodera Masako
Maekawa Toshiro
Ono Koji
Shigeta Atsushi
Chin Randall E.
Ebara Corporation
Kabushiki Kaisha Toshiba
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