Method of and apparatus for cleaning substrate

Details Method of and apparatus for cleaning substrate Method of and apparatus for cleaning substrate

2008-05-21

2011-10-18

Carrillo, Bibi (Department: 1711)

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

C134S003000, C134S018000, C134S026000, C134S027000, C134S028000, C134S034000, C134S036000, C134S041000, C134S042000, C134S113000, C134S186000, C134S902000

Reexamination Certificate

active

08038798

ABSTRACT:
A substrate cleaning apparatus is capable of individually setting a threshold value for use in making a check of a resistivity during a rinsing process on a recipe setting screen in each process step. Thus, by setting each threshold value depending on the type of liquid chemical to be used immediately before the rinsing process, the substrate cleaning apparatus can use an optimum threshold value during the rinsing process in each process step to make a check of the resistivity. This allows the proper completion of the rinsing process in each process step.

REFERENCES:
patent: 5826601 (1998-10-01), Muraoka et al.
patent: 5845660 (1998-12-01), Shindo et al.
patent: 6392417 (2002-05-01), Knotter et al.
patent: 2005/0081886 (2005-04-01), Miyazaki et al.
patent: 2006/0043073 (2006-03-01), Shirakawa et al.
patent: 2006/0213538 (2006-09-01), Umezawa et al.
patent: 2008/0202559 (2008-08-01), Miyazaki et al.
patent: 1311520 (2007-04-01), None
patent: H04-074420 (1992-03-01), None
patent: 5-3186 (1993-01-01), None
patent: 8-103739 (1996-04-01), None
patent: H09-162156 (1997-06-01), None
patent: 2000-68241 (2000-03-01), None
patent: 2001-279477 (2001-10-01), None
patent: 2005-101572 (2005-04-01), None
patent: 2006-253552 (2006-09-01), None
patent: 2008-103435 (2008-05-01), None
patent: 0390545 (2003-09-01), None
Korean Office Action dated Mar. 25, 2010 in corresponding Korean Patent Application (Dispatch) No. 9-5-2010-012490418 with English language translation).
Chinese Office Action dated Nov. 16, 2009 in corresponding Chinese Patent Application No. 2008101005420 (with English language translation).
Japanese Office Action issued by the Japanese Patent Office on Apr. 19, 2011 in connection with corresponding Japanese Patent Application No. 2007-140099 (with English Translation).
Office Action issued by the Chinese Patent Office on Dec. 21, 2010 in connection with corresponding Chinese Patent Application No. 200810100542.0.
Japanese translation of Chinese Office Action issued in connection with Chinese Patent Application No. 200810100542.0 on Dec. 21, 2010.
English translation of Japanese translation of Chinese Office Action issued in connection with Chinese Patent Application No. 200810100542.0 on Dec. 21, 2010.
Japanese Office Action issued by the Japanese Patent Office on Jul. 19, 2011 in connection with corresponding Japanese Patent Application No. 2007-140099 (with English Translation).

Affiliated with

Also associated with

Rating

Method of and apparatus for cleaning substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and apparatus for cleaning substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for cleaning substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4288082