Method of and an apparatus for charged particle beam exposure

Details Method of and an apparatus for charged particle beam exposure Method of and an apparatus for charged particle beam exposure

1992-02-28

1995-04-04

Dzierzynski, Paul M.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

437935, 250400, H01J 326

Patent

active

054040183

ABSTRACT:
A charged particle beam exposure apparatus employs a main deflector made of electromagnetic coils and a subdeflector made of electrostatic deflection electrodes. An exposure method used for this apparatus is capable of shortening a wait time of the main deflector. The main deflector deflects a charged particle beam in a direction X, while the subdeflector deflects the beam around the deflecting position of the main deflector to expose an object to the beam. An area to be exposed on the object is divided into thin subfields such that the width, in an X-axis direction of each subfield, is approximately 1/3 the length in a Y-axis direction of the same.

REFERENCES:
patent: 4494004 (1985-01-01), Mauer, IV et al.
patent: 4607333 (1986-08-01), Yusutake et al.
patent: 4853870 (1989-08-01), Yasutake et al.
patent: 5134300 (1992-07-01), Kai et al.

Affiliated with

Also associated with

Rating

Method of and an apparatus for charged particle beam exposure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and an apparatus for charged particle beam exposure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and an apparatus for charged particle beam exposure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2381802