Method of alignment in exposure step through array error and sho

Details Method of alignment in exposure step through array error and sho Method of alignment in exposure step through array error and sho

1997-01-14

1999-01-05

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

G03F 900

Patent

active

058560548

ABSTRACT:
A method of alignment which can reduce a rotation error and a magnifying rate error of a shot is provided. According to the method of alignment, alignment in the third step (step D) is performed through correction by determining the shot error based on data in X and Y directions in the first step (step B), as well as through correction by determining the array error based on at least one of the data of the alignment marks in X and Y directions in the second step (step C).

REFERENCES:
patent: 5532091 (1996-07-01), Mizutani

Affiliated with

Also associated with

Rating

Method of alignment in exposure step through array error and sho does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of alignment in exposure step through array error and sho, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of alignment in exposure step through array error and sho will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-860669