Method of alignment for efficient defect review

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C382S294000, C382S149000

Reexamination Certificate

active

07995833

ABSTRACT:
An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for observing, at a high resolution, the defect in the semiconductor sample detected by the SEM visual inspection apparatus. The system has a function of transmitting an alignment dictionary image as one of alignment parameters to be set by the SEM visual inspection apparatus using an inspection recipe to the review apparatus.

REFERENCES:
patent: 5604819 (1997-02-01), Barnard
patent: 6047083 (2000-04-01), Mizuno
patent: 6238940 (2001-05-01), Steffan et al.
patent: 6259960 (2001-07-01), Inokuchi
patent: 6407373 (2002-06-01), Dotan
patent: 6476913 (2002-11-01), Machida et al.
patent: 6566654 (2003-05-01), Funatsu et al.
patent: 6583414 (2003-06-01), Nozoe et al.
patent: 6614923 (2003-09-01), Shishido et al.
patent: 2003/0058444 (2003-03-01), Nara et al.
patent: 2003/0063792 (2003-04-01), Hiroi et al.
patent: 2005/0198602 (2005-09-01), Brankner
patent: 10-135288 (1998-05-01), None
patent: 2000-161932 (2000-06-01), None
patent: P2000-232138 (2000-08-01), None
patent: P2001-127125 (2001-05-01), None
patent: 2001-159616 (2001-06-01), None
Japanese Office Action, issued in Japanese Patent Application No. 2003-145600, dated on Dec. 25, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of alignment for efficient defect review does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of alignment for efficient defect review, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of alignment for efficient defect review will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2641478

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.