Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-08-09
2011-08-09
Chang, Jon (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S294000, C382S149000
Reexamination Certificate
active
07995833
ABSTRACT:
An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for observing, at a high resolution, the defect in the semiconductor sample detected by the SEM visual inspection apparatus. The system has a function of transmitting an alignment dictionary image as one of alignment parameters to be set by the SEM visual inspection apparatus using an inspection recipe to the review apparatus.
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Japanese Office Action, issued in Japanese Patent Application No. 2003-145600, dated on Dec. 25, 2007.
Konno Takehiko
Miyai Hiroshi
Chang Jon
Hitachi High-Technologies Corporation
Hitachi Science Systems Ltd.
McDermott Will & Emery LLP
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