Method of aligning electron beam apparatus

Details Method of aligning electron beam apparatus Method of aligning electron beam apparatus

1978-12-28

1983-12-13

Dixon, Harold

Radiant energy

Means to align or position an object relative to a source or...

2504921, 2504922, G01M 2100, A61K 2702

Patent

active

044206917

ABSTRACT:
Electron beam apparatus is used to develop a resist coated work piece such as a semiconductor wafer which is mounted on a moveable XY table within the apparatus work chamber. A work piece holder includes an alignment device for aligning the electron beam for highly accurate beam scanning. Thereafter, the electron beam axes are correlated to the work piece axes. In correlating the axes, the electron beam is rotated whereby the beam X and Y axes are parallel to the work piece X and Y axes, respectively. The work piece axes are then correlated to the axes of the XY table by locating the table coordinates of two known positions on the wafer.

REFERENCES:
patent: 3519788 (1970-07-01), Hatzakis
patent: 3644700 (1972-02-01), Kruppa
"Automatic Pattern Positioning . . ." by Miyauchi et al. IEEE Transactions on Electron Devices vol. 17, No. 6 Jun. 1970 pp. 450-457.

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