Method of aligning deposited nanotubes onto an etched...

Active solid-state devices (e.g. – transistors – solid-state diode – Organic semiconductor material

Reexamination Certificate

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C257S077000, C257S419000, C257SE51040

Reexamination Certificate

active

07858979

ABSTRACT:
A method of forming an aligned connection between a nanotube layer and a raised feature is disclosed. A substrate having a raised feature has spacers formed next to the side of the raised feature. The spacers are etched until the sidewalls of the raised feature are exposed forming a notched feature at the top of the spacers. A patterned nanotube layer is formed such that the nanotube layer overlies the top of the spacer and contacts a side portion of the raised feature in the notched feature. The nanotube layer is then covered with an insulating layer. Then a top portion of the insulating layer is removed to expose a top portion of the etched feature.

REFERENCES:
patent: 6645861 (2003-11-01), Cabral et al.
patent: 2005/0122775 (2005-06-01), Koyanagi et al.
patent: 2007/0029612 (2007-02-01), Sandhu

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