Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Reexamination Certificate
2006-01-17
2006-01-17
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
C430S030000
Reexamination Certificate
active
06986975
ABSTRACT:
The present invention includes a method of determining an alignment between a substrate and a template spaced-apart from the substrate and having a distance defined therebetween, the substrate having a first pattern disposed thereon and the template having a second pattern disposed thereon, the method including, sensing the first and the second pattern, with the distance being established such that the first and the second pattern form a desired moiré pattern when the template and the substrate are in a desired spatial relationship.
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U.S. Appl. No. 09/698,317, filed Oct. 27, 2000, entitled: High Precision Orientation Alignment and Gap Control Stages for Imprint Lithography Processes, naming Inventors Byung Choi et al.
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U.S. Appl. No. 10/864,214, filed Jun. 9, 2004, entitled: Imprint Lithography System to Produce a Light to Impringe upon and Polymerize a Liquid in Superimposition with Template Overlay Marks, naming Inventors Sreenivasan et al.
U.S. Appl. No. 10/923,629, filed Aug. 20, 2004, entitled: Apparatus for Imprint Lithography Using an Electric Field, naming inventors Sreenivasan
Bailey Todd
Choi Byung J.
Colburn Matthew
Sreenivasan Sidlgata V.
Board of Regents , The University of Texas System
Brooks Kenneth C.
Young Christopher G.
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