Method of aligning a semiconductor substrate and a photomask

Details Method of aligning a semiconductor substrate and a photomask Method of aligning a semiconductor substrate and a photomask

1985-02-21

1987-07-14

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

046799427

ABSTRACT:
This specification discloses an alignment method for aligning a photomask with a substrate covered with a photosensitive layer and printing the pattern of the photomask on the substrate. The method comprises the steps of providing a reference mark on the photomask, providing on the substrate a pair of alignment marks correlated to the reference mark, the pair of alignment marks being spaced apart from each other by a predetermined distance in a mark area, one of the pair of alignment marks being formed projectedly relative to the surroundings thereof and the other alignment mark being formed as a depression relative to the surroundings thereof, providing the photosensitive layer on the substrate so that the outermost surface of the layer is substantially flat, and imaging the reference mark and the pair of alignment marks superposedly on an imaging plane by a light having a single wavelength. The specification also discloses a photomask and an apparatus for executing such method.

REFERENCES:
patent: 4007988 (1977-02-01), Bromfield et al.
patent: 4172664 (1979-10-01), Charsky et al.
patent: 4356223 (1982-10-01), Iida et al.
patent: 4362389 (1982-12-01), Koizumi et al.
patent: 4419013 (1983-12-01), Heimer

Affiliated with

Also associated with

Rating

Method of aligning a semiconductor substrate and a photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of aligning a semiconductor substrate and a photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of aligning a semiconductor substrate and a photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1425459