Method of adjusting the index of refraction of photonic...

Details Method of adjusting the index of refraction of photonic... Method of adjusting the index of refraction of photonic...

2005-09-20

2005-09-20

Healy, Brian M. (Department: 2883)

Optical waveguides

Having nonlinear property

C385S129000, C385S130000, C385S131000, C385S132000, C385S141000, C385S014000, C398S098000, C398S101000, C398S102000

Reexamination Certificate

active

06947649

ABSTRACT:
A photonic crystal comprising a waveguide made of material. The waveguide has a periodic set of holes. The material proximate to at least one of the holes in the periodic set of holes exhibits an index of refraction that has been modified by the application of laser energy relative to the material proximate to other holes in the periodic set of holes.

REFERENCES:
patent: 5802236 (1998-09-01), DiGiovanni et al.
patent: 5881186 (1999-03-01), Starodubov
patent: 6075915 (2000-06-01), Koops et al.
patent: 6347171 (2002-02-01), Tatah et al.
patent: 6542682 (2003-04-01), Cotteverte et al.
patent: 6597721 (2003-07-01), Hutchinson et al.
patent: 6640034 (2003-10-01), Charlton et al.
patent: 6687447 (2004-02-01), Flory et al.
patent: 2003/0072519 (2003-04-01), Bolanos
patent: 2003/0123827 (2003-07-01), Salerno et al.
patent: 2003/0202728 (2003-10-01), Leonard et al.
patent: 2003/0223720 (2003-12-01), Li et al.
patent: 2003/0231822 (2003-12-01), Li et al.
patent: 2004/0062505 (2004-04-01), Sugitatsu et al.
M. Li and X. Liu; “IR and UV Femtosecond Laser Micromachining of Si-on-SiO2for Photonic Bandgap Crystal Fabrication”; Mat. Res. Soc. Symp. Proc. vol. 637; pp. E5.8.1-E5.8.5; 2001.
S. Chu et al., “Wavelength Trimming of a Microring Resonator Filter by Means of a UV Sensitive Polymer Overlay”; IEEE Photonics Technology Letters, vol. 11, No. 6; Jun. 1999; pp. 688-690.
Xinging Liu and Gerard Mourou; “Ultrashort Laser Pulses Tackle Precision Machining”; Laser Focus World; Aug. 1997.
Ming Li et al.; “Nanostructuring in submicron-level waveguides with femtosecond laser pulses”; Optics Communications; Sep. 2002.
L. Huang et al.; “GaAs under Ultrafaxt Excitation: Response of te Dielectric Function”; Phys. Rev. Lett. 80, pp. 185-188; 1998.

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