Semiconductor device manufacturing: process – Including control responsive to sensed condition – Electrical characteristic sensed
Reexamination Certificate
2006-12-05
2008-07-01
Wilczewski, M. (Department: 2822)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Electrical characteristic sensed
C438S385000
Reexamination Certificate
active
07393701
ABSTRACT:
Methods of adjusting a resistance of a buried resistor in a semiconductor are disclosed. In one aspect, the method includes using a silicidation blocking mask to define the buried resistor in the semiconductor; adjusting a size of the silicidation blocking mask to adjust a resistance of the buried resistor based on test data from a previous processing lot including a substantially similar buried resistor; and forming silicide on an area not covered by the silicidation blocking mask. The adjustment may be made by balancing the amount of the resistor that is covered with silicide versus un-silicided semiconductor to achieve the desired total resistance. The adjustment may be made according to an algorithm.
REFERENCES:
patent: 3996551 (1976-12-01), Croson
patent: 4451328 (1984-05-01), Dubois
patent: 4643777 (1987-02-01), Maeda
patent: 5126279 (1992-06-01), Roberts
patent: 5185285 (1993-02-01), Hasaka
patent: 5236857 (1993-08-01), Eklund et al.
patent: 5466484 (1995-11-01), Spraggins et al.
patent: 5656524 (1997-08-01), Eklund et al.
patent: 5683928 (1997-11-01), Wojnarowski et al.
patent: 5888875 (1999-03-01), Lasky
patent: 5963780 (1999-10-01), Ling et al.
patent: 6249029 (2001-06-01), Bryant et al.
patent: 6647614 (2003-11-01), Ballantine et al.
patent: 7064413 (2006-06-01), Fried et al.
patent: 7332402 (2008-02-01), Freeman
patent: 2002/0063288 (2002-05-01), Maciejewski et al.
patent: 2005/0110096 (2005-05-01), Ballantine et al.
patent: 2005/0167786 (2005-08-01), Gill et al.
Hershberger Douglas B.
Loiseau Alain
Peterson Kirk D.
Rassel Robert M.
Hoffman Warnick LLC
International Business Machines - Corporation
Sabo William D.
Wilczewski M.
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