Method of activating implanted ions by incoherent light beam

Details Method of activating implanted ions by incoherent light beam Method of activating implanted ions by incoherent light beam

1980-12-15

1984-11-13

Roy, Upendra

Metal treatment

Compositions

Heat treating

29576B, 29576T, 148187, 357 91, H01L 21265

Patent

active

044823932

ABSTRACT:
A process of manufacturing a semiconductor device having the steps of implanting impurity ions to a surface of a semiconductor substrate; and radiating the substrate with incoherent light of which scope is wider than said substrate whereby the implanted region is electrically activated.

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