Method forming focus/exposure matrix on a wafer using overlapped

Details Method forming focus/exposure matrix on a wafer using overlapped Method forming focus/exposure matrix on a wafer using overlapped

1995-12-27

1999-03-02

Nuzzolillo, Maria

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430312, 430394, G03C 500

Patent

active

058768831

ABSTRACT:
A method of forming a focus/exposure matrix on a wafer is provided, wherein the wafer is used to calibrate the photostepper's focus and exposure time settings. The focus/exposure matrix comprising a series of patterns disposed on the wafer. The patterns being arranged in rows and columns. The patterns in a row being characterized by having been formed with substantially the same exposure time and an effective focus that increments between successive row patterns by an amount substantially corresponding to half the focus resolution of the photostepper. The patterns in a column being characterized by having been formed with substantially the same effective focus and an exposure time that increments between successive column patterns by a finite amount.

REFERENCES:
patent: 5049925 (1991-09-01), Aiton et al.
patent: 5114223 (1992-05-01), Torigoe et al.
patent: 5237393 (1993-08-01), Tominaga
patent: 5262822 (1993-11-01), Kosugi et al.
patent: 5300786 (1994-04-01), Brunner et al.

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