Method forming a uniform photoresist film using gas flow

Details Method forming a uniform photoresist film using gas flow Method forming a uniform photoresist film using gas flow

1997-04-02

1998-10-20

Bareford, Katherine A.

Coating processes

Magnetic base or coating

427348, 118 63, B05D 304

Patent

active

058243615

ABSTRACT:
A method for forming a photoresist film on a substrate, includes mounting a substrate on a supporting surface of a supporter so that a stepped portion is produced between the supporting surface and a top surface of the substrate; coating a photoresist on the top surface and a side surface of the substrate, the side surface showing up at the stepped portion; and then; blowing gas over the photoresist on the top surface to make the photoresist a uniform film.

REFERENCES:
patent: 4447467 (1984-05-01), Oguchi et al.
patent: 4870519 (1989-09-01), White
patent: 5358740 (1994-10-01), Bornside et al.

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